JPH0437259U - - Google Patents
Info
- Publication number
- JPH0437259U JPH0437259U JP8046790U JP8046790U JPH0437259U JP H0437259 U JPH0437259 U JP H0437259U JP 8046790 U JP8046790 U JP 8046790U JP 8046790 U JP8046790 U JP 8046790U JP H0437259 U JPH0437259 U JP H0437259U
- Authority
- JP
- Japan
- Prior art keywords
- target material
- sputtering
- cleaning
- block diagram
- gas inlet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 3
- 239000013077 target material Substances 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 2
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8046790U JPH0437259U (en]) | 1990-07-26 | 1990-07-26 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8046790U JPH0437259U (en]) | 1990-07-26 | 1990-07-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0437259U true JPH0437259U (en]) | 1992-03-30 |
Family
ID=31625556
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8046790U Pending JPH0437259U (en]) | 1990-07-26 | 1990-07-26 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0437259U (en]) |
-
1990
- 1990-07-26 JP JP8046790U patent/JPH0437259U/ja active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2000073168A (ja) | 基板の多層pvd成膜装置および方法 | |
JPH0437259U (en]) | ||
JPS6217173A (ja) | 平板マグネトロンスパツタ装置 | |
JPS5650042A (en) | Ion pump for super high vacuum | |
JPS6176673A (ja) | スパツタリング方法 | |
JPS63282263A (ja) | マグネトロンスパッタリング装置 | |
JPS6015700B2 (ja) | スパツタ装置 | |
JPH05275050A (ja) | スパッタイオンポンプ | |
JPS5585671A (en) | Sputtering apparatus | |
JPS56130466A (en) | Film forming method | |
JPH077324Y2 (ja) | 皮膜形成装置 | |
JPH0254225U (en]) | ||
JP3628395B2 (ja) | スパッタカソード | |
JPH0248422Y2 (en]) | ||
JPS61210190A (ja) | 薄膜形成装置 | |
JPS5647564A (en) | Operation of magnetron-type sputtering device | |
JPH0214359U (en]) | ||
JPH0322063U (en]) | ||
JPH0216730A (ja) | エツチング装置 | |
JPH0397855A (ja) | スパッタリング装置 | |
JPH02102461U (en]) | ||
JPS61166966A (ja) | 同軸バレルマグネトロンスパツタ装置 | |
JPH06450Y2 (ja) | コイル可動式イオンプレ−テイング装置 | |
JPS54100988A (en) | Ion plating device | |
JPH02106457U (en]) |